Atomic Layer Depostition (ALD)

A lot of different laboratories are required to do research on atomic layer deposition (ALD).

More information about the research activities, click here. 

 

The Reactor Room

The reactor room contains several ALD reactors; 4 x F120 Sat design, home made powder reactor, home made high temperature reactor, a micro-ALD reactor.

The Scale-Up Room

The TSF500 reactor is the biggest ALD reactor with a reactor chamber that can fit large wafers. This lab is also used for developing ALD equipment and for the FT-IR instrument.

The Wet Chemistry Room

Spin coating is an important technique to create thin films of several hybrid materials. 

The Makerspace Room

We have a makerspace for 3D printing, a versatile tool to visualize models and printing parts to create experimental setups.

The Characterization Room

Several thin film materials have interesting electrical properties, these can be charted by using our 4-point-probe or even the 24-point-probe, resistance measurements and more.

The ODIN Room

The Optical Diagnosis INstrumentation is a setup which allows the user to see how their sample behaves with increasing temperature, which can be a powerful tool for observing visual transitions in situ.

The Dark Room

The Dark Room is a place for exploratory optical characterization of materials. We have a wide selection of optical spectrometers and excitation sources based on fiber optics and build the optical setup for the particular characterization. This is suitable for transmission, reflection, photoluminescence and quantum yield measurements.

The XRF Room

X-ray Fluorescence (XRF) is a characterization method for elemental composition for a thin film or a pellet sample.

Contact

Professor Ola Nilsen